EV Series


Electron beam evaporation is employed to provide a vapour stream from materials commonly difficult to evaporate with standard thermal techniques. An energetic electron beam is targeted onto the source material which has the effect of increasing the temperature. The sources can be used to heat the target material to temperatures in excess of 3000°C (if in rod form) and have an unprecedented control over the temperature range between 200°C and 3000°C. 

Mini electron beam evaporators are employed to give maximum control of the evaporation rate at low fluxes and, importantly, to minimise contamination of the vapour stream for sensitive application areas such as surface science or thin-film doping. The construction of e-beam evaporators should therefore be aimed at maximising the evaporation control and minimising contamination.


Surface Science
The EV sources allow sub-monolayer per minute rate control enabling precise surface loading to be achieved.

Lift-off Processes
The minimal heat-load from the sources coupled with the small spot profile from the source-leading to low angular spread at the sample face-makes this an excellent choice for achieving high-quality metal film structures.

The low thermal load from the QUAD-EV sources and the fine control of the deposition rate allows these sources to be used far closer to the sample face than conventional evaporators. This allows efficient use of expensive materials such as Au, Pd or Pt.

MBE Doping Applications
The fine control of deposition rate and rapid response make these evaporators an excellent choice as doping sources in MBE applications.

Multilayer Materials Deposition
Mantis QUAD-EV e-beam evaporators with its four channel power supply are commonly used to routinely deposit multilayer materials very conveniently.


The QUAD-EV series is available in five models: M-EV (1 x 1000mm3), M-EV-ANGLED (1 x 1000mm3), QUAD-EV-C (4 x 390mm3), QUAD-EV-90 (4 x 390mm3) and QUAD-EV-HP (4 x 1000mm3).  Click here to see the full range.

The Mantis EV Series mini e-beam evaporators are constructed from high-quality, strictly UHV-compatible materials and are fully bakeable to 250°C. The mounting hearths for the source materials and the surrounding evaporation head are highly efficient cooled, ensuring a rapid heat transfer to the cooling water. This allows all but the emission filament and the source material to remain at near ambient temperature, effectively eliminating the structural outgassing which often presents a problem with traditional electron beam evaporators, effusion cells and thermal evaporation boats.

All of the M-EV and QUAD-EV models have integrated flux monitoring plates. These provide real-time feedback of the deposition rate and also can be used in a closed loop control for absolute rate stability and control. The flux monitoring plates are located at the top of the source and below the shutter and can provide an accurate reading of the evaporation rate even with the shutter closed.

The QUAD-EV evaporators use independent filaments, flux-monitoring plates and high-voltage connections to allow each material to be evaporated independently of the other three.  The QUAD-EV-C  is employed to allow independent co-evaporation of up to four materials. Since each material uses and independent high-voltage connection, the evaporator will still function if a short-circuit occurs. The power supplies are of a rugged construction, enabling seamless operation without malfunction during discharges between the filament and source material (as can happen during initial operation after pump-down).

All evaporators can be equipped with either rods or crucibles interchangeably. The choice depends on the evaporation rate required, the material capacity required and the properties of the source material. Please contact us for recommendations.

All e-beam models utilize a user filament that can be replaced quickly.


Power Supplies
     Two models of power supply are available.

  1. A four channel 250W supply for use with the QUAD-EV-C source of four M-EV sources in co-evaporation mode.  This supply includes hardware flux and power control.
  2. A four channel 500W supply for use with the QUAD-EV-C and QUAD-EV-HP sources or four M-EV sources in co-evaporation mode.  This supply includes hardware flux and power control.

Automation Software
For full control and data-logging of all parameters, plus recipe-driven deposition sequences. The key features include Data Charting and the ability to synchronise deposition sequences from more than instrument (i.e. in effect it is possible to have a 8-pocket vaporation program).

Manual and Motor-driven Shutters
Shaped shutter blades are available for the QUAD-EV-C and QUAD-EV-HP sources to allow up to 6 combinations of open/shut pockets to be achieved.

Crucible Liners
Pockets can be equipped with crucibles or rods. An extensive range of crucible options available. All crucibles can accept ceramic liners which are recommended for use with a number of materials. For material compatibility please contact us.


Maximum Power0-250W0-250W0-500W250W250W
Flux MonitoringYesYesYesYesYes
In-vacuum Diameter32mm34mm57mm34mm32mm
Mounting FlangeNW40CF (2.75" O.D.)NW40CF (2.75" O.D.")NW63CF (4.5" O.D.)NW100CF (6" O.D.)NW40CF (2.75" O.D.)
In-vacuum Length (standard)300mm300mm300mm254mm -special length on request300mm
Minimum CoolingMinimum Water flow of 0.5l/min
Crucible Size210, 390, 1000mm3210, 390mm3210, 390, 1000mm3210, 390mm3210, 390, 1000mm3