Rotating and Heating Sample stage

Overview

A dedicated sample stage is a very useful additon to any deposition system. It allows the operator to introduce the sample into the vacuum system with minimal preparation and effort. Furthermore, it ensures that the coatings are uniform, reproducible and the deposition process can be enhanced by extra supplied functionality of the stage.

We manufacture a range of sample stages which is designed to support a variety of PVD processes. The sample stages have many standard functional features such as rotation and heating, and in addition, we may offer a custom solution for your sample size and temperature range.

Every sample stage is constructed to the exact specifications in order to produce a perfect fit for every system.


Features

The sample stage is constructed from SS304 stainless steel and is usually fitted on a NW200CF flange. All parts subjected to extensive heating are made from Molybdenum. In addition, the stage is fitted with an external Mo shielding for protection during deposition of very thick coatings. The shielding is simple to remove and easy to maintain.

Sample rotation
Typically sample rotation is required if the resulting film uniformity should be in the range of +/-5% or better across the wafer.
The rotation capability is delivered by a rotation motor, which is fitted directly on the sample stage main shaft and is controlled via in-house built controller. The stage rotation control speed is set by turning the rotary dial on the controller to the desired setting.
The rotation motor comes in three separate models: 2-20rpm, 20-60rpm and 20-80rpm.

Sample heating
The sample stage is fitted with SiC graphite heater, which provides extremely stable heating of the wafer for an extended period of time. The SiC heater element itself posseses excellent thermal and physical shock resistance and can be used in oxygen-rich atmosphere.

The internally fitted K-type thermocouple is located at the back of the sample and is engineered to measure the sample temperature in its close vicinity. The heating temperature is controlled by using the Eurotherm controller.
The graph below shows how the measured temperature of the sample stage follows the settings of the Eurotherm controller.

As can be seen from the graph, the sample temperature closely follows the Eurotherm settings, which ensures excellent control over the heating process.


Options

RF Bias
RF bias is typically employed for an in-situ cleaning of the sample prior to the main deposition. The cleaning process is carried out by a plasma created in the vicinity of the sample when the chamber is filled with gas and a RF power is applied to the stage.

The surface of the sample in contact with plasma will be bombarded by ions, activated species, excited species, and thermal species. Ions and excited species will release their energies of ionization or excitation when they impinge on the surface of the sample. Locally this release of energy will generate a high local temperature, which will result in a removal of the impurities from the surface of the sample.

As standard Mantis sample stages come with RF bias feedthrough integrated into the assembly. For enabling the RF sample cleaning feature, it is necessary to add 300W RF power supply and have a Ar gas supply.

DC Bias
A DC bias applied to the growing sample influences the total energy and momentum flux of all charged species arriving at the substrate, and hence plays a significant role in modifying the structure of the growing film.

The ions approaching the sample acquire additional energy from the electric field created by the DC bias. The ion bombardment with increased energy results in filling of the voids and the densification of the columnar structure of the growing film. In addition, the energy transferred to the surface increases the surface adatom mobility, which consequently, affects the density of film structure.

During deposition of nanoparticles, the amount of applied DC bias significantly influences the porosity of the nanoparticle film, which in turn affects its resulting physical, optical and electrical characteristics.

The DC bias feature is enabled by adding a DC power supply to the configuration. Typically for sputtering applications, we supply DC power supplies with voltage up to 600V and for nanoparticle control we offer 6kV power supply.

Linear Z-shift
Linear Z-shift motion ensures that the source to sample distance can be changed. This feature is useful for determining the optimum deposition conditions for a particular application. Current design of the sample stage allows Z-shift motion in the range of 0-100mm.

Manual or Motor-Driven Shutters
The sample stage can be outfitted with an integrated shutter. The rotary shutter is configured with a magnetically coupled rotary feedthrough that ensures longevity and UHV compatibility. The stage can be outfitted with either manual or motor actuated shutter.


Specifications

Model SPUTTER NANOPARTICLE
Sample size
2"-6" (50mm-150mm) 2"-4" (50mm-100mm)
Rotation
2-20rpm, 20-60rpm, 20-80rpm 2-20rpm, 20-60rpm, 20-80rpm
Heating Element SiC coated graphite heater SiC coated graphite heater
Heating Temperature 20°C - 800°C 20°C - 800°C
PID Control Yes Yes
DC/RF Bias Up to 2kV/300W Up to 6kV/No
Z-Shift 0-50mm (for sample handover) 0-50mm (for sample handover)
Sample Shutter Manual/Automatic Manual/Automatic