EV Series

Overview

Electron beam evaporation is employed to provide a vapour stream from materials commonly difficult to evaporate with standard thermal techniques. An energetic electron beam is targeted onto the source material which has the effect of increasing the temperature. There is no intrinsic limit to the temperature which can be attained using this method, in contrast to conventional radiative or indirect resistive heating processes.

Mini electron beam evaporators are employed to give maximum control of the evaporation rate at low fluxes and, importantly, to minimise contamination of the vapour stream for sensitive application areas such as surface science or thin-film doping. The construction of e-beam evaporators should therefore be aimed at maximising the evaporation control and minimising contamination.

Applications

Surface Science
The EV sources allow sub-monolayer per minute rate control enabling precise surface loading to be achieved.

Lift-Off Processes
The minimal heat-load from the sources coupled with the small spot profile from the source-leading to low angular spread at the sample face-makes this an excellent choice for achieving high-quality metal film structures.

Contact Metallisation
The low thermal load from the QUAD-EV sources and the fine control of the deposition rate allows these sources to be used far closer to the sample face than conventional evaporators. This allows highly efficient use of expensive contact metallisation materials such as Au, Pd or Pt.

MBE Doping Applications
The fine control of deposition rate and rapid response make these evaporators an excellent choice as doping sources in MBE applications.

Multilayer Materials Deposition
Mantis QUAD-EV e-beam evaporators with its four channel power supply are commonly used to routinely deposit multilayer materials very conveniently.


Features

The Mantis EV Series mini e-beam evaporators are constructed from high-quality, strictly UHV-compatible materials and are fully bakeable to 250°C. The mounting hearths for the source materials and the surrounding evaporation head are highly efficient cooled, ensuring a rapid heat transfer to the cooling water. This allows all but the emission filament and the source material to remain at near ambient temperature, effectively eliminating the structural outgassing which often presents a problem with traditional electron beam evaporators, effusion cells and thermal evaporation boats.

All of the M-EV and QUAD-EV models have integrated flux monitoring plates. These provide real-time feedback of the deposition rate and also can be used in a closed loop control for absolute rate stability and control. The flux monitoring plates are located at the top of the source and below the shutter and can provide an accurate reading of the evaporation rate even with the shutter closed.

Mantis QUAD-EV evaporators use independent filaments, flux-monitoring plates and high-voltage connections to allow each material to be evaporated independently of the other three. In the QUAD-EV-C source this is employed to allow independent co-evaporation of up to four materials. Since each material uses and independent high-voltage connection, the evaporator will still function if a short-circuit occurs. The power supplies are of a rugged construction, enabling seamless operation without shut-down or malfunction during discharges between the filament and source material (as can happen during initial operation after pump-down).

All evaporators can be equipped with either rods or crucibles interchangeably. The choice depends on the evaporation rate required, the material capacity required and the properties of the source material. Please contact us for recommendations.

All e-beam models utilize a user servicable filament that can be replaced quickly. This minimises time needed in the case when the filament is damaged.


Options

Power Supplies
     Two models of power supply are available.

  1. A four channel 250W supply for use with the QUAD-EV-C source of four M-EV sources in co-evaporation mode.  This supply includes hardware flux and power control.
  2. A four channel 500W supply for use with the QUAD-EV-C and QUAD-EV-HP sources or four M-EV sources in co-evaporation mode.  This supply includes hardware flux and power control.

Automation Software
For full control and data-logging of all parameters, plus recipe-driven deposition sequences. The key features include Data Charting and the ability to synchronise deposition sequences from more than instrument (i.e. in effect it is possible to have a 8-pocket evaporation program).

Manual or Motor-Driven Shutters
Shaped shutter blades are available for the QUAD-EV-C and QUAD-EV-HP sources to allow up to 6 combinations of open/shut pockets to be achieved.

Crucible Liners
Pockets can be equipped with crucibles or rods. An extensive range of crucible options are available. All crucibles can accept ceramic liners which are recommended for use with a number of materials. For material compatibility please contact us.


Specifications

Modell M-EV QUAD-EV-C QUAD-EV-HP
Max. Power 0-250W 0-250W 0-500W
Pockets 1 4 4
Flux Monitoring Standard Standard Standard
In-vacuum Diameter 32mm 34mm 57mm
Mounting Flange NW35CF (2 3/4") NW35CF (2 3/4") NW63CF (4 1/2")
In-vacuum Length* (standard) 200mm 200mm 200mm
Minimum Cooling Water (0.5l/min) Water (0.5l/min) Water (0.5l/min)
Co-evaporation No Yes Yes
Crucible Size 1000, 390, 210mm3 390, 210mm3 1000, 390, 210mm3

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