The base ports can accommodate up to four sputtering sources. We can supply 1-4" magnetron sputtering sources for DC or RF operation. More details about our sources are available here.
Alternatively we are happy to incorporate existing or third party guns into the system.
We offer two types of e-beam evaporation sources:
- Low dose, high accuracy
These are intended for highly-controlled, ultra-thin film deposition of refractory materials into the system. See more details here.
- Multi kW sources
These offer high deposition rate and high capacity. Up to two larger sources (single or multi-pocket) may be installed.
Our NanoGen50 nanoparticle source can be installed on the chamber to allow controlled nanoparticle deposition onto the sample. Nanoparticles can be generated from any metal as well as from many compound materials (oxides, nitrides, carbides...) and alloys. The size of the particles is highly controlled - mean between ~0.5nm and 20nm with a narrow size distribution of ±15%. More details are available here.
For the growth of oxides or nitrides at low pressure, it is often necessary to use a more reactive form of oxygen (and certainly nitrogen) to form oxide or nitride compounds. Mantis Deposition manufactures RF plasma sources which are used to generate beams of higly reactive atomic oxygen or nitrogen. These can be incorporated to act alongside conventional metal deposition sources to grow high-quality compound layers. More info can be found here.
Thermal sources such as K-cells can be added. K-cells will fit through standard ports and optional, water-cooled cross-contamination shields can be added around them to improve overall system purity. More details are available here.