NANOSYS Series

Chamber

The Nanosys500 system offers true UHV integrity combined with features crucial to allow the user to explore full potential of nanoparticle deposition. The main chamber has a spherical construction with all ports axes passing through the centre-point. The chamber has internal welds and is polished to minimise outgassing. Numerous ports are provided for deposition components, with emphasis on below-horizontal alignment to accommodate instruments which use crucibles to contain evaporant, such as effusion cells. The chamber can optionally be equipped with removable cross-contamination shielding in applications where high rates of deposition are required.

The system uses turbodrag pumps with dry backing pumps as standard, enabling pressures in the low 10-9 or 10-10 Torr to be achieved (after bakeout). Alternative pumping system can be incorporated at customer request.

Applications

  • Thin-film Solar Cells
  • High-efficiency Photovoltaics
  • Gas Sensors

Sample

Sample Loading
In the basic system, sample entry can be made through a quick-load hinged door (o-ring sealed). For true UHV applications it is necessary to use a sample entry load-lock. Our load-lock uses a magnetically coupled linear/rotary transfer arm to transport samples to the main chamber. Optionally, a sample holder carousel can be included to allow multiple samples to be loaded in the load-lock chamber.

Sample Table
The sample table/manipulator can fit 2" or multiple smaller samples and can be modified for a number of custom configurations.

Options:

  • Variable speed (2-20rpm) sample rotation
  • DC or RF sample table bias
  • Sample heating up to 800°C
  • Sample cooling
  • Z-shift (0-100mm)

The sample cradle in heated sample holders is manufactured of refractory materials.

Components

Mantis Deposition can offer various deposition sources for sample preparation or growth from its selection of in-house deposition instruments or can incorporate sources at the user's request.

Nanoparticle Sources
Nanosys500 is usually fitted with a nanoparticle source NanoGen50 to allow controlled nanoparticle deposition onto the sample. Nanoparticles can be generated from any metal as well as from many compound materials (oxides, nitrides, carbides...) and alloys. The size of the particles is highly controlled - mean between ~0.5nm and 20nm with a narrow size distribution of ±15%. More details are available here.

E-beam Sources
E-beam evaporators are installed for thin film deposition of refractory metals or high-temperature ceramics. These instruments feature integral flux monitoring for all pockets, independent high-voltage lines, efficient structural cooling and co-deposition of up to four materials. Further details can be found here.

RF Ion Sources
RF ion sources can be incorporated into the system for etching or assisted deposition. The sources provide a broad, uniform beam in the range 0-1keV with high current density. More info can be found here.

Atomic Sources
For the growth of oxides or nitrides at low pressure or reaction with emergent nanoclusters, it is often necessary to use a more reactive form of oxygen (and certainly nitrogen) to form oxide or nitride compounds. Mantis Deposition manufactures RF plasma sources which are used to generate beams of higly reactive atomic oxygen or nitrogen. These can be incorporated to act alongside conventional metal deposition sources to grow high-quality compound layers. More info can be found here.

Auxiliaries

Gauges
The system is configured as standard with full-range gauges to allow seamless pumpdown monitoring.
Ports can be included for RHEED, ellipsometry, residual gas analysers or thin film monitors.
Optionally, additional analysis equipment can be included at the user's request.

Automation
The system can be automated using touchscreen-based pumpdown or using process automation feature in in-house developed software.