Mantis Deposition can offer various deposition sources for sample preparation or growth from its selection of in-house deposition instruments or can incorporate sources at the user's request.
Nanosys500 is usually fitted with a nanoparticle source NanoGen50 to allow controlled nanoparticle deposition onto the sample. Nanoparticles can be generated from any metal as well as from many compound materials (oxides, nitrides, carbides...) and alloys. The size of the particles is highly controlled - mean between ~0.5nm and 20nm with a narrow size distribution of ±15%. More details are available here.
E-beam evaporators are installed for thin film deposition of refractory metals or high-temperature ceramics. These instruments feature integral flux monitoring for all pockets, independent high-voltage lines, efficient structural cooling and co-deposition of up to four materials. Further details can be found here.
RF Ion Sources
RF ion sources can be incorporated into the system for etching or assisted deposition. The sources provide a broad, uniform beam in the range 0-1keV with high current density. More info can be found here.
For the growth of oxides or nitrides at low pressure or reaction with emergent nanoclusters, it is often necessary to use a more reactive form of oxygen (and certainly nitrogen) to form oxide or nitride compounds. Mantis Deposition manufactures RF plasma sources which are used to generate beams of higly reactive atomic oxygen or nitrogen. These can be incorporated to act alongside conventional metal deposition sources to grow high-quality compound layers. More info can be found here.