The
NanoGen50 source is designed for the deposition of
size-selected nanoparticles under UHV conditions.
NanoCluster Deposition System
The
Nanosys500 system is a dedicated system for the
deposition of nanoparticulate films.
RF Atom
Sources
The MATS
series RF atom sources can be used to grow high-quality
oxides or nitride films using highly reactive, yet low
energy atomic species.
Mini
E-beam Evaporators
The EV
series mini e-beam evaporators are designed for
highly-controlled evaporation of materials under
ultra-clean UHV conditions.
Thermal
Gas Crackers
The MGC75
thermal gas cracker is designed as source of atomic
hydrogen and oxygen in UHV applications where low
operational pressure and minimal contamination is
required.
RF Ion
Sources
RF ion
sources generate a beam of energetic ions for
applications such as ion-beam assisted deposition,
sputter deposition and milling.
Magnetron Sputtering sources
The CUSP
series magnetron sputtering cathodes are
designed for high-rate, large area coatings. We
offer UHV, HV and internal mount versions for 1"
to 3" target.
Deposition
Systems
Mantis Deposition offers turn-key deposition
systems with an emphasis on configuration
flexibility. Our systems are based around our
own UHV deposition components and extensive
experience with deposition processes.
