Nanoparticle Deposition RF Atom Sources for atomic oxygen and atomic nitrogen Mini E-beam evaporators RF Ion Sources Thermal atomic oxygen and atomic hydrogen source Deposition systems

 

RF Ion Source for IBD / IBAD Processing and Deposition
 Beams of accelerated ions are used to modify and erode surfaces under vacuum conditions. By carefully selecting the energy and composition of an ion-beam, this can be used, for example, to improve significantly the characteristics of a growing film by both densifying the film and modifying the chemical composition of the film. Alternatively, ion beams can be used to erode (mill) existing films or sputter a target material to project a plume of material for deposition on a substrate. In the latter case, the growing films can have excellent qualities for many applications owing to the elevated kinetic energy of the sputtered material.

 

High Current Density and High Purity
The RFMax Series are designed to operate with high current density and low contamination levels.  The enhanced plasma is entirely contained within a high-purity ceramic zone resulting in the minimum of metallic contamination.  The sources use either a dual or triple grid system to accelerate the ion beam towards the target.  The grid configuration is carefully arranged to ensure minimal beam impingement on the outer grids resulting in maximum beam throughput and prolonged grid lifetime.

The discharge zone is manufactured from high-quality materials ensuring minimal contamination of the beam.   All MANTIS RFMax sources are available with a range of automation options as well as beam neutralization. A uniquely designed, low back-sputter beam sampler is also available to measure the actual beam current.

The end-user can define the optimum gas flow by selecting from a range of different end-plates.  These plates can be further customized to give maximum uniformity for a given sample size, distance and angle to the source.

 

Model

RFMax30

RFMax60

RFMax130

Beam Diameter
(at source exit)

30 mm

60 mm

130 mm
Beam Current Density >5mA/cm2 >6mA/cm2 >3mA/cm2

RF Power Supply

600 Watts

600 Watts

1000 Watts
RF Tuning Manual* Manual* Automatic
Beam Energy 50-1000eV 50-1000eV 100-1000eV
DC Power
Supply		 screen grid screen grid screen and
accel. grids

Gas Flow Rate

5-20 sccm

5-20 sccm

5-30 sccm
Water Cooling
(@ 20oC)		 0.5
liters/sec		 0.5
liters/sec		 0.5
liters/sec

In-vacuum Diameter

59 mm

98 mm

198 mm

Mounting Flange

NW63CF (4.5")

NW100CF (6”)

NW200CF (10”)

*Automatic Tuning optional

NOTE:  Specifications subject to change without prior notification.