The CUSP series
magnetron sputter sources are designed for high-rate,
large area coatings. All sources are equipped as
standard with integral gas-feed allowing a higher local
pressure to exist immediately above the sputter target
than in the surrounding chamber with the consequence
that the source can be operated at lower overall chamber
pressure.
All sources use a grounded
cooling circuit, avoiding the need for lengthy plastic
tubing to insulate the cooling water and allowing simple
mains water to be used.
The sources are manufactured
entirely from UHV-compatible materials. Flange-mounted
sources can be removed without first needing to remove
gas-injectors or shutters (if installed).
We offer three sizes of
planar, circular magnetrons, 1", 2" and 3". Each size
can be CF or ISO mounted or alternatively internally
mounted with a variety of mounting options.
Options:
