We are pleased to announce that we have taken on the responsibilities of sales/marketing Crestec Electron Beam Lithography (EBL) equipment in the USA and Canada. Crestec, a Japanese Corporation, has developed and sold advanced high resolution EBL systems for industrial and university customers throughout the world since 1995.  Crestec offers 30keV and 50keV “CABL” models which incorporate a uniquely designed electron optics column with electrostatic beam control and closed-loop temperature control.  This high beam stability allows very high resolution of dense patterns to be written down to 10nm and below.

Crestec CABL tools therefore have the ability to nano-fabricate and also surpass the current limitations of optical fabrication.  Crestec systems can also be applied to maskless, mask-making and direct-writing technologies.  The ability to fabricate ultra fine patterns will allow the advancement optical communications, MEMS, sensors, microelectronics, opto-electronics, and nanotechnology.