UHV COMPONENTS
Deposition components lie at the heart of any system and are the core expertise of Mantis scientists and engineers. Our range of UHV components spans many adjacent
deposition techniques - from semi-industrial coating tools to finely controlled evaporation sources for sub-monolayer films.
E-BEAM EVAPORATORS
Mini electron beam evaporators are employed to give maximum control of the evaporation rate at low fluxes and, importantly, to minimize contamination of the vapour stream for sensitive application areas such as surface science or thin-film doping. The construction of mini e-beam evaporators should therefore be aimed at maximizing the evaporation control and minimizing contamination.
PLASMA SOURCES
RF atom sources have been used with great success in many semiconductor film-growth applications, such as GaN, GaInNAs, ultra-thin Al2O3, high-K dielectrics and are being employed in a range of other applications such as data storage, catalytic films, and surface cleaning with atomic hydrogen.
THERMAL GAS CRACKERS
Thermal Gas Crackers are used to dissociate molecular gases. most commonly hydrogen, to atomic form, thereby increasing their reactivity by many orders of magnitude. In contrast to plasma-based atom sources (such as our MATS series) there is no intrinsic minimum in the gas flow requirement, which makes these sources suitable for low-flow applications such as Surface Science.
NANOPARTICLE SOURCES
At Mantis Deposition we offer a complementary range of instruments for the deposition and characterisation of nanoparticles. Our instruments allow precise beams of size-selected nanoparticles to be generated from almost any elemental or alloy base material. In addition, reactive particle generation allows oxide or nitride compound nanoclusters to be deposited. We can offer instruments for retrofit to existing vacuum chambers or complete system solutions for nanoparticle film growth.
ION SOURCES
Beams of accelerated ions are used to modify and erode surfaces under vacuum conditions. By carefully selecting the energy and composition of an ion-beam, this can be used, for example, to improve significantly the characteristics of a growing film by both densifying the film and modifying the chemical composition of the film. Alternatively, ion beams can be used to erode (mill) existing films or sputter a target material to project a plume of material for deposition on a substrate. In the latter case, the growing films can have excellent qualities for many applications owing to the elevated kinetic energy of the sputtered material.
SPUTTERING SOURCES
The CUSP series magnetron sputter sources are designed for high-rate, large area coatings. All sources are equipped as standard with integral gas-feed allowing a higher local pressure to exist immediately above the sputter target than in the surrounding chamber with the consequence that the source can be operated at lower overall chamber pressure. We offer true-UHV sources with no o-rings or elastomers. The magnets are not contained within the water-cooling circuit and are consequently not subject to potential corrosion problems.
K-CELLS
The Mantis Comcell effusion cell series are designed for high-purity, high-precision evaporation of materials in MBE or hybrid UHV applications.
THERMAL BOAT SOURCES
TBS-2-800 thermal boat sources are designed for light thin film metal evaporation.
SYSTEM COMPONENTS
Mantis Deposition manufacatures a series of different system components such as substrate tables and load-lock chambers that can be fitted into your existing deposition system.
Deposition Systems
Already have an instrument? Take a look at our deposition systems.
Ask Our Advice
The expert team of Mantis Deposition engineers and staff scientists has the long history of experience to assist in choosing the optimum instrument for your application. Various members of our team have more than 20 years of high vacuum and UHV deposition experience.