The QBox series systems are based on a front-loading box-type chamber with all source ports using conflat flanges as standard. This allows excellent chamber access for cleaning and sample reloading. All joints are internally welded and internal surfaces can be electropolished on request.
Base ports are confocal as standard allowing a wider variety of deposition sources to be employed than with non-confocal arrangements. When configured for sputtering, the system can be specified as sputter-up or sputter-down while maintaining all the standard features.
The system is equipped as standard with a 300ls-1 turbo pump, but alternative pumping speed or types can be specified.
Applications
Anti-reflection Coatings
Dielectrics
Nanostructured Films
Multilayers
Optical Coatings
Device Metallisation
Ultra-thin Films
Sample Loading
As standard, sample loading is achieved through the front door allowing large samples or those with complex geometry to be mounted.
Optionally, a load-lock can be installed for clean sample transfer while leaving the main chamber under vacuum. Sample transfer is actuated via a magnetically-coupled transfer arm. Sample hand-off is enabled via a z-shift lift-off on the sample table.
Sample Table
The sample table/manipulator is configured as standard for 2" (52mm) samples but can be modified for samples up to 6" in diameter or multiple smaller samples.
Options:
- Variable speed (2-20rpm) sample rotation
- DC or RF sample table bias
- Sample heating up to 800°C
- Sample cooling
- Z-shift (0-100mm)
The sample cradle in heated sample holders is manufactured of refractory materials to maintain system purity.
Sputtering Sources
The base ports can accommodate up to five sputtering sources. We can supply 1-4" magnetron sputtering sources for DC or RF operation. The sources can be equipped with standard or high-strength magnets and additionally balanced or unbalanced magnet sets. More details about our sources are available here.
Alternatively we are happy to incorporate existing or third party guns into the system.
E-beam Sources
We offer two types of e-beam evaporation sources:
- Low dose, high accuracy
These are intended for highly-controlled, ultra-thin film deposition of refractory materials into the system. See more details here. - Multi kW sources
These offer high deposition rate and high capacity. Up to two larger sources (single or multi-pocket) may be installed.
Nanoparticle Sources
Our NanoGen50 nanoparticle source can be installed on the chamber to allow controlled nanoparticle deposition onto the sample. Nanoparticles can be generated from any metal as well as from many compound materials (oxides, nitrides, carbides...) and alloys. The size of the particles is highly controlled - mean between ~0.5nm and 20nm with a narrow size distribution of ±15%. More details are available here.
Atomic Sources
For the growth of oxides or nitrides at low pressure, it is often necessary to use a more reactive form of oxygen (and certainly nitrogen) to form oxide or nitride compounds. Mantis Deposition manufactures RF plasma sources which are used to generate beams of higly reactive atomic oxygen or nitrogen. These can be incorporated to act alongside conventional metal deposition sources to grow high-quality compound layers. More info can be found here.
Thermal Sources
Thermal sources such as K-cells can be added. K-cells will fit through standard ports and optional, water-cooled cross-contamination shields can be added around them to improve overall system purity. More details are available here.
Gauges
The system is configured as standard with full-range gauges to allow seamless pumpdown monitoring.
Ports can be included for RHEED, ellipsometry, residual gas analysers or thin film monitors.
Optionally, additional analysis equipment can be included at the user's request.
Automation
The system can be automated using touchscreen-based pumpdown or using process automation feature in in-house developed software.